The HMDS pretreatment system can uniformly coat a layer of HMDS on the surface of the wafer and substrate by reducing the working temperature, processing time and processing time of the oven pretreatment process, reducing the contact angle of the silicon wafer after HMDS treatment The amount of photoresist to improve the adhesion of photoresist and silicon.
HMDS pretreatment system, HMDS oven Characteristics:
1, Pre-processing performance better
2, The treatment is more uniform
3, High efficiency
4, More savings liquid
5, More environmentally friendly and safe
6, Low-pressure alarm device
7, Can automatically draw HMDS function
8, Can automatically add HMDS function
9, HMDS liquid leakage alarm function
10, HMDS emergency evacuation function
11, Data record printing function